{"id":5846,"date":"2026-06-01T11:00:01","date_gmt":"2026-06-01T03:00:01","guid":{"rendered":"https:\/\/hwleiclaser.com\/?post_type=news&#038;p=5846"},"modified":"2026-06-01T11:00:01","modified_gmt":"2026-06-01T03:00:01","slug":"hwleic-laser-showcases-advanced-sic-laser-processing-solutions-at-third-generation-semiconductor-technology-seminar","status":"publish","type":"news","link":"https:\/\/hwleiclaser.com\/ru\/%d0%bd%d0%be%d0%b2%d0%be%d1%81%d1%82%d0%b8\/hwleic-laser-showcases-advanced-sic-laser-processing-solutions-at-third-generation-semiconductor-technology-seminar\/","title":{"rendered":"HWlEiC Laser Showcases Advanced SiC Laser Processing Solutions at Third-Generation Semiconductor Technology Seminar"},"content":{"rendered":"<h2>Third-Generation Semiconductor SiC Crystal Growth and Wafer Processing Technology Seminar<\/h2>\n<p>On May 28, 2026, the Third-Generation Semiconductor SiC Crystal Growth and Wafer Processing Technology Seminar, hosted by China Powder Network, was successfully held at the Sheraton Hefei Xinzhan Ligang Hotel.<\/p>\n<p>A total of 220 experts, researchers, technical professionals, and industry representatives from across the silicon carbide (SiC) value chain attended the event. The seminar focused on in-depth discussions covering SiC single crystal growth technologies, advancements in wafer processing techniques, equipment applications, and future development trends of the SiC industry.<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-5837\" src=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-1-1024x683.webp\" alt=\"\u65b0\u4e00\u4ee3\u534a\u5bfc\u4f53\u5168\u81ea\u52a8\u6fc0\u5149\u9000\u706b\u8bbe\u5907\" width=\"843\" height=\"562\" title=\"\" srcset=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-1-1024x683.webp 1024w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-1-300x200.webp 300w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-1-768x512.webp 768w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-1-18x12.webp 18w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-1.webp 1536w\" sizes=\"auto, (max-width: 843px) 100vw, 843px\" \/><\/p>\n<h2>1. Analysis of Industry Development and Competitive Landscape<\/h2>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-5838\" src=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-2-1024x682.webp\" alt=\"\" width=\"839\" height=\"559\" title=\"\" srcset=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-2-1024x682.webp 1024w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-2-300x200.webp 300w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-2-768x511.webp 768w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-2-18x12.webp 18w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-2.webp 1537w\" sizes=\"auto, (max-width: 839px) 100vw, 839px\" \/><\/p>\n<p>Mr. Yao Shuang, Deputy General Manager of HWlEiC Laser, delivered a keynote presentation titled:<\/p>\n<p><strong>\u201cApplication of Laser Precision Processing in SiC Materials\u201d<\/strong><\/p>\n<p>The presentation provided a comprehensive analysis of the current development status and competitive landscape of the SiC industry, while systematically elaborating on the strategic significance of laser processing technologies in advancing SiC manufacturing.<\/p>\n<p><strong>Non-contact Laser Lift-Off (LLO) technology<\/strong> effectively eliminates tool wear and avoids mechanical stress-induced wafer damage, which are common issues in conventional processing methods. This enables high-quality and high-precision wafer separation, significantly improving both processing efficiency and yield of SiC wafers.<\/p>\n<p>At the same time, LLO technology contributes to reducing the manufacturing cost of SiC substrates by minimizing material loss. It demonstrates clear advantages, including:<\/p>\n<ul>\n<li>High processing efficiency<\/li>\n<li>Low material loss<\/li>\n<li>Stable processing quality<\/li>\n<\/ul>\n<p>&nbsp;<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-5845\" src=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-2-1024x718.webp\" alt=\"\" width=\"911\" height=\"639\" title=\"\" srcset=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-2-1024x718.webp 1024w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-2-300x210.webp 300w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-2-768x538.webp 768w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-2-18x12.webp 18w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-2.webp 1498w\" sizes=\"auto, (max-width: 911px) 100vw, 911px\" \/><\/p>\n<p>Next-Generation Fully Automatic SiC Laser Lift-Off Equipment<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-5843\" src=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-3-979x1024.webp\" alt=\"\" width=\"816\" height=\"854\" title=\"\" srcset=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-3-979x1024.webp 979w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-3-287x300.webp 287w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-3-768x804.webp 768w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-3-11x12.webp 11w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-3.webp 1226w\" sizes=\"auto, (max-width: 816px) 100vw, 816px\" \/><\/p>\n<p>Next-Generation Fully Automatic Semiconductor Laser Annealing Equipment<\/p>\n<p>&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8212;&#8211;<\/p>\n<h2>New Generation Fully Automatic Laser Processing Equipment<\/h2>\n<p>During the seminar, HWlEiC Laser officially launched:<\/p>\n<ul>\n<li><strong>New-generation fully automatic Laser Lift-Off (LLO) equipment<\/strong><\/li>\n<li><strong>Fully automatic laser annealing systems<\/strong><\/li>\n<\/ul>\n<p>Compared with the previous generation, the new systems have achieved significant improvements in technical performance, reflecting substantial advancements in process capability and system integration.<\/p>\n<p>More importantly, this release demonstrates that HWlEiC Laser has developed the capability to deliver <strong>automated SiC production line solutions<\/strong>, moving beyond standalone equipment toward integrated manufacturing systems.<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-5844 size-large\" src=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-1-1024x459.webp\" alt=\"\" width=\"1024\" height=\"459\" title=\"\" srcset=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-1-1024x459.webp 1024w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-1-300x135.webp 300w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-1-768x344.webp 768w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-1-1536x689.webp 1536w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-1-18x8.webp 18w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/17-1.webp 1873w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<h2>Technical Exchange and Industry Engagement<\/h2>\n<p>At the exhibition area, experts and industry professionals from various segments of the SiC ecosystem\u2014including substrate manufacturing, epitaxy, device fabrication, and packaging\u2014engaged in active discussions.<\/p>\n<p>The exchanges focused on:<\/p>\n<ul>\n<li>Technical advantages of next-generation SiC wafer Laser Lift-Off equipment<\/li>\n<li>Laser annealing process optimization<\/li>\n<li>Production line integration and compatibility solutions<\/li>\n<\/ul>\n<p>The on-site discussions were highly interactive, reflecting strong industry interest in advanced laser processing technologies for SiC applications.<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-5839\" src=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-3-1024x768.webp\" alt=\"\" width=\"799\" height=\"599\" title=\"\" srcset=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-3-1024x768.webp 1024w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-3-300x225.webp 300w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-3-768x576.webp 768w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-3-16x12.webp 16w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-3.webp 1448w\" sizes=\"auto, (max-width: 799px) 100vw, 799px\" \/><\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-5840\" src=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-4-1024x683.webp\" alt=\"\" width=\"797\" height=\"532\" title=\"\" srcset=\"https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-4-1024x683.webp 1024w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-4-300x200.webp 300w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-4-768x512.webp 768w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-4-18x12.webp 18w, https:\/\/hwleiclaser.com\/wp-content\/uploads\/2026\/06\/3-4.webp 1536w\" sizes=\"auto, (max-width: 797px) 100vw, 797px\" \/><\/p>\n<h2>Strategic Advancement Toward the Pan-Semiconductor Field<\/h2>\n<p>The launch of the new-generation fully automatic Laser Lift-Off and laser annealing systems marks a significant milestone in HWlEiC Laser\u2019s strategic expansion into the pan-semiconductor sector.<\/p>\n<p>Looking ahead, the company will continue to:<\/p>\n<ul>\n<li>Increase investment in research and development<\/li>\n<li>Strengthen industry\u2013university\u2013research collaboration<\/li>\n<li>Enhance core technological capabilities<\/li>\n<li>Improve overall product competitiveness<\/li>\n<\/ul>\n<p>HWlEiC Laser remains committed to delivering advanced laser processing solutions that support the continuous evolution of semiconductor manufacturing.<\/p>","protected":false},"excerpt":{"rendered":"<p>On May 28, 2026, the Third-Generation Semiconductor SiC Crystal Growth and Wafer Processing Technology Seminar, hosted by China Powder Network, was successfully held at the Sheraton Hefei Xinzhan Ligang Hotel.<\/p>","protected":false},"featured_media":5838,"comment_status":"closed","ping_status":"closed","template":"","class_list":["post-5846","news","type-news","status-publish","has-post-thumbnail","hentry"],"acf":[],"_links":{"self":[{"href":"https:\/\/hwleiclaser.com\/ru\/wp-json\/wp\/v2\/news\/5846","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/hwleiclaser.com\/ru\/wp-json\/wp\/v2\/news"}],"about":[{"href":"https:\/\/hwleiclaser.com\/ru\/wp-json\/wp\/v2\/types\/news"}],"replies":[{"embeddable":true,"href":"https:\/\/hwleiclaser.com\/ru\/wp-json\/wp\/v2\/comments?post=5846"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/hwleiclaser.com\/ru\/wp-json\/wp\/v2\/media\/5838"}],"wp:attachment":[{"href":"https:\/\/hwleiclaser.com\/ru\/wp-json\/wp\/v2\/media?parent=5846"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}